Design of beam pose automatic alignment system for an interference lithography scanner
ZHU Yu1,2, WANG Leijie1, ZHANG Ming1, QI Lishan2
1. State Key Laboratory of Tribology, Department of Mechanical Engineering, Tsinghua University, Beijing 100084, China;
2. School of Mechatronics Engineering, University of Electronic Science and Technology of China, Chengdu 611731, China
Abstract：An accurate automatic beam alignment system is designed for beam alignment in an interference lithography scanner. The iterative alignment system uses the previously measured value in the next iteration step for the iterative alignment procedure that iterates the beam alignment in two orthogonal planes. The alignment procedure then compensates for the error accumulation and pico-motor coupling in the two orthogonal plane. Tests demonstrate that the position and angle accuracy of this automatic beam alignment system with four degrees of freedom are better than 5 μm and 3 μrad, which satisfies the alignment requirements for an interference lithography scanner.
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2015, Vol. 55 
