Abstract：Chemical mechanical polishing (CMP) has a flexible elastic diaphragm that couples the mechanical deformations of the parts and complicates the pressure control. The coupling problem is solved here using offline identification based on working point linearization + quantitative coupling analysis + quantitative decoupled cooperative control. The working point linearization gives a multi-zones model. The relative gain array (RGA) method gives the degree of coupling. The feed-forward compensation decoupling controller provides the quantitative decoupling. Simulations and experiments show that this method decouples the pressure system in the multiple zones in engineering practice, so the system has less overshoot and faster response with the same control method.
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2015, Vol. 55 
