扫描干涉光刻机光束位姿自动准直系统设计

朱煜, 王磊杰, 张鸣, 祁利山

清华大学学报（自然科学版） ›› 2015, Vol. 55 ›› Issue (7) : 716-721,733.

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清华大学学报（自然科学版） ›› 2015, Vol. 55 ›› Issue (7) : 716-721,733.
机械工程

扫描干涉光刻机光束位姿自动准直系统设计

  • 朱煜1,2, 王磊杰1, 张鸣1, 祁利山2
作者信息 +

Design of beam pose automatic alignment system for an interference lithography scanner

  • ZHU Yu1,2, WANG Leijie1, ZHANG Ming1, QI Lishan2
Author information +
文章历史 +

摘要

针对扫描干涉光刻机对干涉光束的高精度位姿准直需求, 设计了高精度光束自动准直系统; 基于该系统提出了利用每步迭代调节后的位姿实测值作为下一步迭代的起始值进行迭代准直和正交平面内位姿交替准直的光束位姿迭代准直策略, 解决了迭代过程误差积累问题和正交平面内电机耦合问题。实验结果显示: 该光束自动准直系统能够实现两个位置准直精度均优于5 μm和两个角度准直精度均优于3 μrad, 满足扫描干涉光刻机光束位姿准直精度需求。

Abstract

An accurate automatic beam alignment system is designed for beam alignment in an interference lithography scanner. The iterative alignment system uses the previously measured value in the next iteration step for the iterative alignment procedure that iterates the beam alignment in two orthogonal planes. The alignment procedure then compensates for the error accumulation and pico-motor coupling in the two orthogonal plane. Tests demonstrate that the position and angle accuracy of this automatic beam alignment system with four degrees of freedom are better than 5 μm and 3 μrad, which satisfies the alignment requirements for an interference lithography scanner.

关键词

光束自动准直 / 迭代准直策略 / 扫描干涉光刻机

Key words

beam automatic alignment / iteration alignment strategy / interference lithography scanner

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朱煜, 王磊杰, 张鸣, 祁利山. 扫描干涉光刻机光束位姿自动准直系统设计[J]. 清华大学学报（自然科学版）. 2015, 55(7): 716-721,733
ZHU Yu, WANG Leijie, ZHANG Ming, QI Lishan. Design of beam pose automatic alignment system for an interference lithography scanner[J]. Journal of Tsinghua University(Science and Technology). 2015, 55(7): 716-721,733
中图分类号： TH74   

参考文献

[1] Jitsuno T, Motokoshi S, Okamoto T, et al. Development of 91 cm size gratings and mirrors for LEFX laser system [J].Journal of Physics: Conference Series, 2008, 112(3), 032002.
[2] Konkola P. Design and Analysis of a Scanning Beam Interference Lithography System for Patterning Gratings with Nanometer-Level Distortions [D]. Boston, MA, USA: Massachusetts Institute of Technology, 2003.
[3] Chen C. Beam Alignment and Image Metrology for Scanning Beam Interference Lithography: Fabricating Gratings with Nanometer Phase Accuracy [D]. Boston, MA, USA: Massachusetts Institute of Technology, 2003.
[4] Montoya J. Toward Nano-Accuracy in Scanning Beam Interference Lithography [D]. Boston, MA, USA: Massachusetts Institute of Technology, 2006.
[5] Konkola P, Chen C, Heilmann R, et al. Beam steering system and spatial filtering applied to interference lithography [J]. Journal of Vacuum Science & Technology B, 2000, 18(6): 3282-3286.
[6] Lublin L, Warkentin D, Das P, et al. High-performance beam stabilization for next-generation ArF beam delivery systems [C]//Proceedings of SPIE. Bellingham, WA, USA: SPIE, 2003, 5040: 1682-1693.
[7] Farinas A, View M, Green E, et al. Optical Beam Steering and Sampling Apparatus and Method [P]. USA: US7528364 B2. 2009.
[8] 李耀, 王丁, 郭晓杨, 等. 基于CMOS传感器的高速高精度激光光束自动准直系统 [J]. 中国激光, 2013, 40(9): 0916002-1-0916002-7.LI Yao, WANG Ding, GUO Xiaoyang, et al. Fast and accurate laser beam automatic alignment system based on CMOS sensor [J]. Chinese Journal of Lasers, 2013, 40(9): 0916002-1-0916002-7. (in Chinese)
[9] 鲍建飞, 黄立华, 曾爱军, 等. 光刻机照明系统中光束稳定技术研究 [J]. 中国激光, 2012, 39(9): 0908004-1-0908004-7. BAO Jianfei, HUANG Lihua, ZENG Aijun, et al. Study on beam stabilization technique in lithography illumination system [J].Chinese Journal of Lasers, 2012, 39(9): 0908004-1-0908004-7. (in Chinese)
[10] 李红, 王东方, 邹伟, 等. 高功率激光装置光束自动准直系统设计 [J]. 中国激光, 2013, 40(10): 1002003-1-1002003-7. LI Hong, WANG Dongfang, ZOU Wei, et al. Design of high power laser beam automatic alignment system [J].Chinese Journal of Lasers, 2013, 40(10): 1002003-1-1002003-7. (in Chinese)
[11] 尉鹏飞, 刘军, 李晓芳, 等. 激光光束实时检测与自动准直系统 [J]. 光学学报, 2008, 28(8): 1590-1595.WEI Pengfei, LIU Jun, LI Xiaofang, et al. Design of laser beam real-time monitoring and adaptive collimation system [J]. Chinese Journal of Lasers, 2008, 28(8): 1590-1595 (in Chinese)
[12] Chen C, Heilmann R, Joo C, et al. Beam alignment for scanning beam interference lithography [J]. Journal of Vacuum Science & Technology B, 2002, 20(6): 3071-3074.

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