Design of beam pose automatic alignment system for an interference lithography scanner

ZHU Yu; WANG Leijie; ZHANG Ming; QI Lishan

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Journal of Tsinghua University(Science and Technology) ›› 2015, Vol. 55 ›› Issue (7) : 716-721,733.

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Design of beam pose automatic alignment system for an interference lithography scanner

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Abstract

An accurate automatic beam alignment system is designed for beam alignment in an interference lithography scanner. The iterative alignment system uses the previously measured value in the next iteration step for the iterative alignment procedure that iterates the beam alignment in two orthogonal planes. The alignment procedure then compensates for the error accumulation and pico-motor coupling in the two orthogonal plane. Tests demonstrate that the position and angle accuracy of this automatic beam alignment system with four degrees of freedom are better than 5 μm and 3 μrad, which satisfies the alignment requirements for an interference lithography scanner.

Key words

beam automatic alignment / iteration alignment strategy / interference lithography scanner

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ZHU Yu, WANG Leijie, ZHANG Ming, QI Lishan. Design of beam pose automatic alignment system for an interference lithography scanner[J]. Journal of Tsinghua University(Science and Technology). 2015, 55(7): 716-721,733

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