Design of phase locking system for an interference lithography scanner

WANG Leijie, ZHANG Ming, ZHU Yu, LU Sen, YANG Kaiming

Journal of Tsinghua University(Science and Technology) ›› 2015, Vol. 55 ›› Issue (7) : 722-727.

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Journal of Tsinghua University(Science and Technology) ›› 2015, Vol. 55 ›› Issue (7) : 722-727.
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Design of phase locking system for an interference lithography scanner

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Abstract

An interference image phase locking system is built for an interference lithography scanner. This system has a feedback control system and uses the homodyne interference method for fast, accurate phase drift measurement and an acousto-optic modulator to accurately shift the phase of the interference image. Tests show that the system has ±1/25 interference image period accuracy when the system uses closed-loop control, which illustrates that this phase locking system has good locking performance. In addition, the system has a short optical path, is easy to assemble and adjust, and has a high laser utilization ratio, so the system is suitable for high-speed interference lithography scanners.

Key words

interference lithography scanner / phase locking / homodyne phase interferometer / acousto-optic modulator

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WANG Leijie, ZHANG Ming, ZHU Yu, LU Sen, YANG Kaiming. Design of phase locking system for an interference lithography scanner[J]. Journal of Tsinghua University(Science and Technology). 2015, 55(7): 722-727

References

[1] Qiao J, Kalb A, Guardalben M, et al. Large-aperture grating tiling by interferometry for petawatt chirped-pulse-amplification systems [J]. Optics Express, 2007, 15(15): 9562-9574.
[2] Britten J, Molander W, Komashkoa M, et al. Multilayer dielectric gratings for petawatt-class laser systems [C]//Proceedings of SPIE. Bellingham, WA, USA: SPIE, 2004, 5273: 1-7.
[3] Dixit S, Britten J, Hyde R, et al. Fabrication and applications of large aperture diffractive optics [C]//Proceedings of SPIE. Bellingham, WA, USA: SPIE, 2001, 4440: 101-108.
[4] Jitsuno T, Motokoshi S, Okamoto T, et al. Development of 91 cm size gratings and mirrors for LEFX laser system [J].Journal of Physics: Conference Series, 2008, 112(3), 032002.
[5] Jong F, Pasch B, Castenmiller T, et al. Enabing the lithography roadmap: An immersion tool based on a novel stage positioning system [C]//Proceedings of SPIE. Bellingham, WA, USA: SPIE, 2009, 7274: 72741S1-72741S10.
[6] WANG Leijie, ZHANG Ming, ZHU Yu, et al. A novel heterodyne planar grating encoder system for in-plane and out-of-plane displacement measurement with nanometer-resolution [C]//Proceedings of the 29th Annual Meeting of the American Society for Precision Engineering. Raleigh, NC, USA: ASPE, 2014: 173-177.
[7] Chen C, Heilmann R, Joo C, et al. Beam alignment for scanning beam interference lithography [J]. Journal of Vacuum Science & Technology B, 2002, 20(6): 3071-3074.
[8] Joo C, Pati G, Chen C, et al. Precision fringe metrology using a Fresnel zone plate [J]. Journal of Vacuum Science & Technology B, 2002, 20(6): 3075-3079.
[9] Zhao Y, Trumper D, Heilmann R, et al. Optimization and temperature mapping of an ultra-high thermal stability environmental enclosure [J]. Precision Engineering, 2010, 34(1): 164-170.
[10] Heilmann R, Konkola P, Chen C, et al. Relativistic corrections in displacement measuring interferometry [J]. Journal of Vacuum Science & Technology B, 2000, 18(6): 3277-3281.
[11] Heilmann R, Konkola P, Chen C, et al. Digital heterodyne interference fringe control system [J]. Journal of Vacuum Science & Technology B, 2001, 19(6): 2342-2346.
[12] 宋莹, 巴音贺希格, 齐向东, 等. 移频式全息光栅曝光干涉条纹锁定系统的设计 [J]. 光学 精密工程, 2014, 22(2): 318-324. SONG Ying, Bayanheshig, QI Xiangdong, et al. Design of frequency-shift interference fringe locking system in holographic grating exposure [J]. Optics and Precision Engineering, 2014, 22(2): 318-324. (in Chinese)
[13] Schattenburg M, Chen C, Everett P, et al. Sub-100 nm metrology using interferometrically produced fiducials [J]. Journal of Vacuum Science & Technology B, 1999, 17(6): 2692-2697.
[14] Young P, Priambodo P, Maldonado T, et al. Simple interferometric fringe stabilization by charge-coupled-device-based feedback control [J]. Applied Optics, 2006, 45(19): 4563-4566.
[15] 钱国林, 李朝明, 殷庆琰, 等.全息曝光条纹锁定系统特性研究 [J]. 激光技术, 2008, 32(6): 648-650.QIAN Guolin, LI Chaoming, YIN Qingyan, et al. Study of characteristic of fringe locking system used to exposure holography [J]. Laser Technology, 2008, 32(6): 648-650. (in Chinese)
[16] 朱煜, 王磊杰, 张鸣, 等. 一种激光干涉光刻系统 [P]. 中国: CN103092003B. 2013.ZHU Yu, WANG Leijie, ZHANG Ming, et al. A Laser Interference Lithography System [P]. China: CN103092003B. 2013. (in Chinese)
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